tecuum AG, low cost vacuum evaporators   applied
Home About Us Products Customers Support News Videos Contact
VCM600 V1
VCM600 V2
VCM600 V2 SS
VCM600 V3
VCM600 V3 rack
VCM600 V3 rack Glove Box
VCM600 V4
VCM600 V5
VCM600 SP3 rack
EVP 3030
Organic Sources PID ( SET)
VCM 600 V3_GB
Rack type Vacuum Evaporator
for Glove Box (GB)
  can be attached to
existing glove box
Special tools provided

VCM 600 V3_GB, is a special thermal evaporator, designed to be attached to a glove box.
The SS vacuum chamber and the instruments rack, are both, placed UNDER the glove box.
No chamber INSIDE the GB. Only a flat SS door is placed on the bottom plane INSIDE the GB. The whole GB volume is free.

The cylindrical vacuum chamber is attached OUTSIDE the GB, to the under surface of the GB bottom plane, using a special adapter to secure tightness. A SS door with glass viewport is placed on the chamber sidewall. The evaporator is loaded and cleaned, from atmospheric side, through this SS door. INSIDE the GB, on the bottom plane, exist a second SS door. Via this door the user have access to the substrate holder for loading / unloading the samples and venting the chamber with GB gas.

The tall stainless steel vacuum chamber and the excellent geometry of the system, support the creation of thin films of metals or other materials on your samples, placed on supplied substrate holder, with high uniformity, min 95% on dia=10cm substrate, or min 92% on the optional dia=20cm substrate.

The "high power version" of each of the two
individual Power supplies, deliver 300A (350A short time) for thin and thick films formation.

The all SS vacuum chamber incorporates:
- Special adapter to fit to the glove box.
- SS base plate with (8x) 1 inch ports (2x free)
- 2x separate thermal sources with
  4x high current OFHC cooper feedthroughs
    for sequential or co-evaporation
- High vacuum TURBO pump (80l/s - 100l/s)
- Vacuum chamber pumping port, NW 100, with
    protection grid
- 1x water cooled quartz crystal head for film
    thickness monitoring

- 1x Pirani - Cold Plasma Penning compact head
  1000 - 5.0x 0-9 hPa
- 1x Electromagnetic shutter with adjustable
    shutter position

- 3x vacuum ports (2xNW25, 1xNW40)

On the, Inside the GB, SS door are:
- Special adapter to fit to the Glove Box
    bottom plane
- Heated substrate holder, up to 350 Celsius,
   circular form dia=10cm with sample holders
- Vent valve (manual)
- 1x NW40 vacuum port

The compact instruments RACK incorporates:
- FULL informative TURBO pump controller for
    detailed information and full control on Turbo
    pump parameters
- FULL informative controller for Pirani - Cold
    Plasma Penning head 1000 - 5.0x10-9 hPa
- Thermal sources power control unit (PCU) with:
    - 2x individual high current AC power units
        150A continuous (200A short time)
    - 2x 0-100% heating current control
    - 2x current meters
    - 2x power unit protection interlock
    - Max filament temperature 1800 Celsius
- Substrate heating PID controller
- SQM-160 2ch high sensitivity quartz crystal
    thickness monitor control unit.
- Electromagnetic shutter control system

- Primary pump (rough pump), control switch,
   operation indicator, power socket
- Water line connectors (input-output)
- Water indicator, water line interlock
- Power 110/220 Vac - 50/60Hz

Included in delivery
- Wet type rough pump, pumping speed
  100 l/min, ultimate vacuum 5.0x10-3 hPa.

This pump is powered and controlled from
instruments rack.

The evaporator is loaded and cleaned through the door with the glass window, on vacuum chamber sidewall.

It is vented with the GB neutral gas, using the vent valve located on the SS door INSIDE GB.

Glove Box with VCM600
Glove Box with VCM600 _02

VCM600 Glove Box substrate heater
VCM600_glove_box thermal sources

Base pressure
• 5.0x10-6 hPa with Standard (80l/s -100l/s) turbomolecular pump
• 1.0x10-6 hPa with optional 300l/s high power turbomolecular pump
For all units, a full set of options is offered (at extra cost).  

tecuum ag www.tecuum.com
Gertrudstrasse 1
8400 Winterthur